| 摘要 |
<p>Plasma is generated by an inductive magnetic field generated from a coil and the surface of a ZnSe substrate is etched by that plasma. According to the method, a pattern having an internal angle between the sidewall of the pattern and the surface of the ZnSe substrate of not smaller than 75˚ is obtained. Consequently, a ZnSe diffraction type optical component having enhanced diffraction efficiency and exhibiting excellent performance can be provided.</p> |
