发明名称 A Planar Schottky Diode and Manufacturing Method
摘要 A Schottky diode (1) has an N+ GaAs active mesa (3) with a vertical side wall on which is grown a nGaAs epilayer (4). A cathode (9) extends over the substrate (3) at one end and the mesa (3). An Si02 barrier isolates the cathode (9) from the epilayer (4). An anode has a contact pad (8) and a narrow finger (7) extending centrally on the substrate (2) to contact the epilayer (4) to provide a Schottky contact of very small area. The cathode is annealed on the substrate (2) and active mesa (3) to achieve particularly low resistance, before the Schottky contact is formed.
申请公布号 WO03096433(A1) 申请公布日期 2003.11.20
申请号 WO2003IE00068 申请日期 2003.05.12
申请人 UNIVERSITY COLLEGE CORK-NATIONAL UNIVERSITY OF IRLAND, CORK.;PIKE, JOHN 发明人 PIKE, JOHN
分类号 H01L21/329;H01L29/872;(IPC1-7):H01L29/872 主分类号 H01L21/329
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