发明名称 |
A Planar Schottky Diode and Manufacturing Method |
摘要 |
A Schottky diode (1) has an N+ GaAs active mesa (3) with a vertical side wall on which is grown a nGaAs epilayer (4). A cathode (9) extends over the substrate (3) at one end and the mesa (3). An Si02 barrier isolates the cathode (9) from the epilayer (4). An anode has a contact pad (8) and a narrow finger (7) extending centrally on the substrate (2) to contact the epilayer (4) to provide a Schottky contact of very small area. The cathode is annealed on the substrate (2) and active mesa (3) to achieve particularly low resistance, before the Schottky contact is formed.
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申请公布号 |
WO03096433(A1) |
申请公布日期 |
2003.11.20 |
申请号 |
WO2003IE00068 |
申请日期 |
2003.05.12 |
申请人 |
UNIVERSITY COLLEGE CORK-NATIONAL UNIVERSITY OF IRLAND, CORK.;PIKE, JOHN |
发明人 |
PIKE, JOHN |
分类号 |
H01L21/329;H01L29/872;(IPC1-7):H01L29/872 |
主分类号 |
H01L21/329 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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