发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To form a perovskite structure of a ferroelectric film having orientation (111) by an MOCVD method. SOLUTION: When forming the perovskite type ferroelectric film by an MOCVD method, an initial layer having orientation (111) is formed first in a low oxygen concentration, the deposition of the ferroelectric film is continued thereon in a high oxygen concentration, and then the whole of the ferroelectric film is subjected to the orientation (111) by using the initial layer as a core. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003324101(A) 申请公布日期 2003.11.14
申请号 JP20020129063 申请日期 2002.04.30
申请人 FUJITSU LTD 发明人 KURASAWA MASAKI;MARUYAMA KENJI
分类号 H01L21/316;H01L21/8246;H01L27/105;(IPC1-7):H01L21/316 主分类号 H01L21/316
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