发明名称 |
Charging control and dosimetry system for gas cluster ion beam |
摘要 |
A method and apparatus for gas cluster ion beam (GCIB) processing uses X-Y scanning of the workpiece relative to the GCIB. A neutralizer reduces surface charging of the workpiece by the GCIB. A single Faraday cup sensor is used to measure the GCIB current for dosimetry and scanning control and also to measure and control the degree of surface charging that may be induced in the workpiece during processing.
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申请公布号 |
US6646277(B2) |
申请公布日期 |
2003.11.11 |
申请号 |
US20010036179 |
申请日期 |
2001.12.26 |
申请人 |
EPION CORPORATION |
发明人 |
MACK MICHAEL E.;LIBBY BRUCE K. |
分类号 |
H01J37/04;H01J37/02;H01J37/244;H01J37/304;H01J37/317;(IPC1-7):G01N23/00;G21G5/00;H01J37/08;C23C14/00 |
主分类号 |
H01J37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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