| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist removal system and a resist removal method for effectively removing resist. SOLUTION: The resist removal system comprises a surface breaking apparatus for partially breaking the surface of the resist formed on a substrate, and a solution processing apparatus for dissolving the resist of which surface has been partially broken by the surface breaking apparatus. The partial breakage of the resist surface facilitates the penetration of the solution into the resist when the resist is dissolved with the solution, thus making it possible to remove the resist more effectively. COPYRIGHT: (C)2004,JPO |
