| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a substrate by which not only the central part of the substrate but also the peripheral part can be cleaned satisfactorily, and to provide a device for cleaning the substrate. SOLUTION: On a scan arm 22 which can lockingly move over the substrate W, in a state that the scan arm 22 extends so as to pass over the rotational center of the substrate W, a first and second ultrasonic nozzles 23, 24 are mounted so that each nozzle can individually eject a cleaning liquid to the rotational center and the periphery of the substrate W. When the substrate W is in a cleaning process, while the substrate W is rotated in a horizontal plane with a spin chuck 1, the cleaning liquid to which an ultrasonic vibration is given from the first and the second ultrasonic nozzles 23, 24 is supplied to the upper surface of the rotating substrate W. At that time, the scan arm 22 is lockingly moved repeatedly within a prescribed angle range. COPYRIGHT: (C)2004,JPO
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