beta-diketonatocopper(I) complex containing allene compounds as ligand and process for producing the same

摘要

A beta-diketonatocopper(I) complex which contains as a ligand (L) an allene compound and is represented by formula (2)wherein, R6 and R7 may be the same or different and each represents linear or branched C1-4 alkyl, C1-4 alkoxy, or linear or branched C1-4 fluoroalkyl, R8 represents hydrogen or fluorine, and L represents the allene compound, and a process for producing the same. The complex is useful in forming a thin copper film by metal-organic vapor deposition (hereinafter abbreviated as MOCVD) method.