发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX CONTAINING THE COMPOSITION
摘要 PURPOSE: A negative photosensitive resin composition, a black matrix containing the composition and its preparation method are provided, to improve the heat resistance, the chemical resistance, the optical density, the developing property, the low reflectivity and the surface smoothness. CONSTITUTION: The negative photosensitive resin composition comprises 0.5-10 parts by weight of a heat resistant black pigment; 1-20 parts by weight of an alkali-soluble resin binder; 1-20 parts by weight of a polymeric compound having ethylenically unsaturated bonds; 0.5-10 parts by weight of a photopolymerization initiator or a photoinitiator; and 40-97 parts by weight of a solvent. Preferably the black pigment is at least one selected from the group consisting of graphite, iron oxide, cobalt black, manganese black, titanium black and black-colored glass or ceramic.
申请公布号 KR20030083919(A) 申请公布日期 2003.11.01
申请号 KR20020022319 申请日期 2002.04.23
申请人 LG CHEM. LTD. 发明人 CHOI, DONG CHANG;KIM, JUN HYEONG;KONG, YEONG SEON;YOON, JEONG AE
分类号 G03F7/004;(IPC1-7):G03F7/004 主分类号 G03F7/004
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