发明名称 |
Large size semiconductor crystal with low dislocation density |
摘要 |
A large semiconductor crystal has a diameter of at least 6 inches and a low dislocation density of not more than 1x10<4 >cm<-2>. The crystal is preferably a single crystal of GaAs, or one of CdTe, InAs, GaSb, Si or Ge, and may have a positive boron concentration of not more than 1x10<16 >cm<-3 >and a carbon concentration of 0.5x10<15 >cm<-3 >to 1.5x10<15 >cm<-3 >with a very uniform concentration throughout the crystal. Such a crystal can form a very thin wafer with a low dislocation density. A special method and apparatus for producing such a crystal is also disclosed.
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申请公布号 |
US2003200913(A1) |
申请公布日期 |
2003.10.30 |
申请号 |
US20030430027 |
申请日期 |
2003.05.05 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
KAWASE TOMOHIRO;HASHIO KATSUSHI;SAWADA SHIN-ICHI;TATSUMI MASAMI |
分类号 |
C30B11/00;C30B15/00;(IPC1-7):C30B15/00;C30B21/06;C30B27/02;C30B28/10;C30B30/04 |
主分类号 |
C30B11/00 |
代理机构 |
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代理人 |
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地址 |
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