| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing system, thereby enabling effective use of the space in a clean room, etc. SOLUTION: Substrate processing apparatus 100 are arranged in a clean room. Each substrate processing apparatus 100 includes a processing unit 101, an exposure processing unit STP, and an interface IFB provided between both the units 101 and STP, and is disposed so that a short side of the processing unit 101 may be aligned with a short side of the exposure-processing unit STP. A long side of a processing portion 120 in the processing unit 101 and a long side of a processing portion 120 in the processing unit 101, included in the other substrate processing apparatus 100, are opposite each other separated by a distance. |
