发明名称 RADIATION-SENSITIVE RESIN COMPOSITION USED FOR INSULATION FILM FORMATION OF ORGANIC EL DISPLAY ELEMENT BY INK-JET SYSTEM, INSULATION FILM FORMED FROM ORGANIC EL DISPLAY ELEMENT AND ORGANIC EL DISPLAY ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition for an insulation film formation of an organic EL display element enabling a pattering by radiation and at the same time, optimized for a manufacture of an organic EL insulation film by a low-cost ink-jet system, an insulation film formed with above, and an organic EL display element equipped with the insulation film. <P>SOLUTION: The composition includes (a) an alkaline soluble resin, (b) a 1,2-quinonediazido compound, and (c) a solvent with a boiling point of not less than 180&deg;C under normal pressure. The insulation film is formed with above, and the organic EL display element is equipped with the insulation film. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003303692(A) 申请公布日期 2003.10.24
申请号 JP20020106725 申请日期 2002.04.09
申请人 JSR CORP 发明人 SHIRAKI SHINJI;NIWA KAZUAKI;SASAKI HIROBUMI;BABA ATSUSHI
分类号 B41J2/01;C08K5/00;C08K5/28;C08K5/3492;C08L63/00;C08L101/00;C09D5/25;C09D7/12;C09D163/00;C09D201/00;G03F7/004;H01L51/50;H05B33/10;H05B33/12;H05B33/14;H05B33/22 主分类号 B41J2/01
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