发明名称 SYSTEM AND METHOD OF PREPARING SEMICONDUCTOR MANUFACTURING FLOW, AND METHOD OF TRANSFERRING SEMICONDUCTOR MANUFACTURING FLOW
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a system and a method of preparing a semiconductor manufacturing flow which facilitates the preparation, editing, or changing of a semiconductor manufacturing flow as compared with a conventional case, and thus saves labor and a time for the preparation, editing, or changing of the semiconductor manufacturing flow, and also to provide a method of transferring the semiconductor manufacturing flow which facilitate the transfer of the control of the semiconductor manufacturing flow as compared to the conventional case. <P>SOLUTION: The semiconductor manufacturing flow preparation system 100 comprises an input section 110 which enables the input of process information with regard to a structure formed in a semiconductor substrate in a semiconductor manufacturing process; a storage section 120 which stores production management information associated with the process information which includes requirements for processing the semiconductor substrate by means of a semiconductor manufacturing apparatus in the semiconductor manufacturing process; and a conversion section 130 which obtains the production management information associated with the process information inputted into the input section 110 from the storage section 120, and converts it into the manufacturing flow of the semiconductor device. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003297712(A) 申请公布日期 2003.10.17
申请号 JP20020104341 申请日期 2002.04.05
申请人 TOSHIBA CORP 发明人 OZAKI YUICHIRO
分类号 G06Q50/04;G06Q50/00;H01L21/02;(IPC1-7):H01L21/02;G06F17/60 主分类号 G06Q50/04
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