发明名称 PHASE CHANGEABLE MEMORY CELL HAVING VOID AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A phase changeable memory cell having a void and manufacturing method thereof are provided to be capable of minimizing the thermal interference between neighboring cells. CONSTITUTION: A phase changeable memory cell is provided with a lower interlayer dielectric(66) formed at the upper portion of a semiconductor substrate(51), a plurality of storage node plugs(70) contacting the predetermined regions of the semiconductor substrate through the lower interlayer dielectric, and a plurality of information storage elements(74) formed on each storage node plug. The phase changeable memory cell further includes a plate electrode(80) formed at the upper portion of the resultant structure for being electrically connected with each upper surface of the information storage elements and a void(75a) for partially exposing the information storage element.
申请公布号 KR20030080843(A) 申请公布日期 2003.10.17
申请号 KR20020019672 申请日期 2002.04.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JU, JAE HYEON;HO, RI I
分类号 H01L27/10;H01L27/115;(IPC1-7):H01L27/115 主分类号 H01L27/10
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