| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for removing a selected metal ion from plasma. SOLUTION: The equipment containing a plasma chamber and at least one silica substrate attached to the interior of the chamber is provided. More specifically, the substrate is exposed in the chamber so that when the metal ions from the plasma make contact with the substrate, the ions may be spread in the substrate to form a liquid layer. Moreover, a receptacle is provided so as to receive liquid from the layer when the liquid flows from the substrate. COPYRIGHT: (C)2004,JPO
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