发明名称 NOVEL POLYETHER COMPOUND CONTAINING ACID GROUP AND UNSATURATED GROUP, PROCESS FOR PRODUCING THE SAME, AND RESIN COMPOSITION
摘要 A cyclohexyl ring-containing polyether compound which has, per molecule, two or more polymerizable unsaturated groups represented by (meth)acryloyloxy and one or more acid groups represented by carboxy; a resin composition containing the polyether compound which has high developability with a dilute alkali and sensitivity and is suitable for use in image formation, e.g., for forming a solder resist or pigment-dispersed resist for a printed wiring board, etc.; and a cured article obtained by curing the resin composition.
申请公布号 WO03085028(A1) 申请公布日期 2003.10.16
申请号 WO2003JP04195 申请日期 2003.04.02
申请人 DAICEL CHEMICAL INDUSTRIES, LTD.;OKAZAKI, AKIRA;MIYAKE, HIROTO 发明人 OKAZAKI, AKIRA;MIYAKE, HIROTO
分类号 C08F290/14;C08G65/22;C08G65/26;C08G65/329;C08G65/332;C08G65/334;C08G65/335;G03F7/027;G03F7/038;(IPC1-7):C08G65/26;C08F299/02 主分类号 C08F290/14
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