DEVICE FOR ACCOMMODATING SUBSTRATES

摘要

The invention concerns a device for accommodating substrates (S), particularly wafers or silicon substrates used for producing photovoltaic elements. The inventive device comprises two walls (1) situated opposite one another, whereby at least two rod-like supporting elements (2, 3) are provided that connect the walls (1), and the supporting elements (2, 3) are provided with holding means (5) for holding substrates (S) supported on the supporting elements in a vertical position oriented parallel to the walls (1). The aim of the invention is to enable the substrates to float in the treatment bath while simultaneously enabling an easiest possible loading and unloading. To this end, at least one rod-like supporting counter element is provided, which connects both walls and is arranged relative to the supporting elements in such a manner as to limit a vertical movement of the substrate (S) relative to the walls (1) and to enable the substrates to be loaded or unloaded at an angle to the vertical direction.