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发明名称
VERFAHREN ZUM BETREIBEN EINES CVD-REAKTORS HOHER PLASMA-DICHTE MIT KOMBINIERTER INDUKTIVER UND KAPAZITIVER EINKOPPLUNG
摘要
申请公布号
AT251798(T)
申请公布日期
2003.10.15
申请号
AT19950302801T
申请日期
1995.04.26
申请人
APPLIED MATERIALS, INC.
发明人
SAHIN, TURGUT;REDEKER, FRED C.;NOWAK, ROMUALD;LI, SHIJIAN;DYER, TIMOTHY;WITTY, DEREK R.
分类号
H05H1/46;C23C16/44;C23C16/50;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32
主分类号
H05H1/46
代理机构
代理人
主权项
地址
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