发明名称 |
METHODS AND APPARATUS FOR DEPOSITION OF THIN FILMS |
摘要 |
A method for depositing a thin film includes the steps of providing a vapor including at least one selected vapor phase component into an evacuated chamber and condensing the vapor onto a heated substrate to form a liquid phase deposit wherein a temperature of the substrate is lower than the condensation temperature of the component. The liquid deposit is then cooled to produce a solid phase film. The invention can provide two or more vapor phase components. The invention can be used to deposit a wide variety of layers, including thin films of metallic, semiconductor and nonmetallic inorganic materials. The invention is useful for forming solid electrolytes and the electrodes for batteries, fuel cells and other electromagnetically active devices.
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申请公布号 |
WO03083166(A1) |
申请公布日期 |
2003.10.09 |
申请号 |
WO2003US09375 |
申请日期 |
2003.03.26 |
申请人 |
ENER1 BATTERY COMPANY |
发明人 |
KALYNUSHKIN, YEVGEN;SHEMBEL, ELENA;NOVAK, PETER;FLURY, CHRIS |
分类号 |
C23C14/08;C23C14/22;C23C14/24;(IPC1-7):C23C16/00 |
主分类号 |
C23C14/08 |
代理机构 |
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