发明名称 FERROELECTRIC LAYER AND MANUFACTURING METHOD, AND FERROELECTRIC CAPACITOR AND PIEZOELECTRIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a ferroelectric layer for improving surface morphology where the surface morphology is improved, a ferroelectric memory device and a piezoelectric device where the ferroelectric layer is applied. <P>SOLUTION: The manufacturing method of the ferroelectric layer comprises steps of (a) forming a ferroelectric film 20, and (b) forming an embedded insulating film 30 on the ferroelectric film 20. The step (b) includes a step of stacking a raw material liquid layer 32 on the ferroelectric film 20 by turning raw material liquid for the embedded insulating film into mist. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003282560(A) 申请公布日期 2003.10.03
申请号 JP20020085573 申请日期 2002.03.26
申请人 SEIKO EPSON CORP 发明人 SAWAZAKI TATSUO
分类号 C04B41/87;C04B35/00;C04B35/495;H01L21/316;H01L21/8246;H01L27/105;H01L41/187;H01L41/317;H01L41/39 主分类号 C04B41/87
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