发明名称 |
SRAM MEMORY CELL AND ITS MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an SRAM memory cell in which a floating effect occurring when an SOI substrate is used and to provide a method for manufacturing the same. <P>SOLUTION: The method for manufacturing the SRAM memory cell comprises a step of coupling a floated body of an access transistor AT of the SRAM to a source region of a driver transistor DT via a body extended part formed by extending an active region. Thus, a passivation effect is prevented. An undesired pn junction formed between the body extended part and the source region of the driver transistor is electrically coupled by forming a silicide or overetching a VSS contact to form a conductive contact plug. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2003282738(A) |
申请公布日期 |
2003.10.03 |
申请号 |
JP20030067914 |
申请日期 |
2003.03.13 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
JUNG MU-KYENG;KIM YOUNG-WUG;KANG HEE-SUNG |
分类号 |
H01L21/8244;H01L21/84;H01L27/11;H01L27/12;H01L29/786 |
主分类号 |
H01L21/8244 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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