PLATING SOLUTION CONTROL DEVICE, PLATING APPARATUS PROVIDED THEREWITH, AND METHOD FOR PREPARING COMPOSITION OF PLATING SOLUTION

摘要

PROBLEM TO BE SOLVED: To provide a plating solution control device which has high accuracy of the replenishment of the replenishment solution, and capable of decreasing the quantity of the replenishment solution to be disposed. SOLUTION: This plating solution control device includes an analysis unit to analyze the plating solution in a plating apparatus, and a replenishment unit 21 to replenish the replenishment solution of the quantity determined based on the result of analysis of the analysis unit to the plating solution in the plating apparatus. The replenishment unit 21 includes a substantially sealed mixing vessel 9 to store the plating solution, and a replenishment solution feed unit 13 to feed first and second replenishment solutions to the mixing vessel 9. Replenishment pipes 24 and 25 are disposed between the mixing vessel 9 and plating solution storage tanks 4a and 4b of the plating apparatus. Replenishment solution feed units 15A and 15B are disposed between the replenishment solution feed unit 13 and the mixing vessel 9. An air pump 46 is connected to the mixing vessel 9 via a feed/exhaust pipe 45. COPYRIGHT: (C)2004,JPO