发明名称 Arrangement and method for degassing small-high aspect ratio drilled holes prior to wet chemical processing
摘要 An arrangement and method for the degassing small high-aspect ratio drilled holes or vias which are present in panels such as printed circuit boards prior to wet chemical processing, including copper plating of the vias, in order to remove any air or gas bubbles from the vias tending to inhibit the reliable plating thereof. This is carried out through the utilization of an ultrasonic prewetting in a liquid bath preceding cleaning for the electroless plating process, thereby enabling all of the vias or holes to be degassed; in effect, having air removed and the vias or holes filled with liquid; thereby allowing subsequent process cleansing solutions to easily flow into the respective holes or vias in order to facilitate the electroless copper plating process.
申请公布号 US6626196(B2) 申请公布日期 2003.09.30
申请号 US20010882235 申请日期 2001.06.15
申请人 INTERNATIONAL BUSINES MACHINES CORPORATION 发明人 DOWNES, JR. FRANCIS J.;GALASCO RAYMOND T.;LEHMAN LAWRENCE P.;TOPA ROBERT D.
分类号 B01D19/00;B08B3/12;C23C18/18;H05K3/00;(IPC1-7):B08B3/12 主分类号 B01D19/00
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