| 摘要 |
A stacked FeRAM uses a structure where the bit line is formed above the ferroelectric capacitor. The word line is formed so that it moves away from the opposing other word line in areas near the contact plug with the relevant contact plug in between, and moves toward the other word line in areas not near the contact plug, and the contact hole is formed so that it is displaced alternately with respect to the longitudinal centerline of the relevant plate line.
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