发明名称 Method of making a patterned retarder, patterned retarder and illumination source
摘要 A method of making a patterned retarder of the present invention includes the steps of providing an alignment layer rubbing the alignment layer in a first rubbing direction, masking with a mask at least one first region of the alignment layer, to reveal at least one second region of the alignment layer, rubbing the at least one second region through the mask in a second rubbing direction different from the first rubbing direction, removing the mask, disposing on the alignment layer a layer of birefringent material whose optic axis is aligned by the alignment layer, and fixing the optic axis of the birefringent layer.
申请公布号 US6624863(B1) 申请公布日期 2003.09.23
申请号 US19980105348 申请日期 1998.06.26
申请人 SHARP KABUSHIKI KAISHA 发明人 JACOBS ADRIAN MARC SIMON;ACOSTA ELIZABETH JANE;HARROLD JONATHAN;TOWLER MICHAEL JOHN;WALTON HARRY GARTH
分类号 G02F1/1337;G02B5/30;G02B27/00;G02B27/26;G02B27/28;G02F1/1335;H04N13/00;(IPC1-7):G02F1/133 主分类号 G02F1/1337
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