发明名称 |
Method and apparatus for performing final critical dimension control |
摘要 |
The present invention provides for a method and an apparatus for control of final critical dimensions during processing of semiconductor wafers. A manufacturing run of semiconductor devices is processed. Metrology data from the processed semiconductor devices is acquired. A final critical dimension control adjustment process is performed using the acquired metrology data. A feedback/feed-forward modification process is performed in response to the final critical dimension control adjustment process.
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申请公布号 |
US6625512(B1) |
申请公布日期 |
2003.09.23 |
申请号 |
US20000625140 |
申请日期 |
2000.07.25 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
GOODWIN GREG |
分类号 |
G03F7/20;H01L21/02;H01L21/027;H01L21/66;(IPC1-7):G06F19/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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