发明名称 Solid state imaging device and method for manufacturing solid state imaging device
摘要 A solid state imaging device includes a transparent insulation film. The insulation film is laminated on transfer electrodes over the power supply lines. A transparent protection film, which has a refractive index that is greater than that of the insulation film, is laminated on the insulation film. The transparent insulation film has portions above the channels in which the thickness continuously increases from the center of adjacent channels to the associated channel separating region.
申请公布号 US2003168678(A1) 申请公布日期 2003.09.11
申请号 US20030382413 申请日期 2003.03.05
申请人 KONISHI MINORU 发明人 KONISHI MINORU
分类号 H01L21/00;H01L21/8238;H01L27/08;H01L27/14;H01L27/146;H01L27/148;H01L27/15;H01L29/16;H01L29/74;H01L29/768;H01L31/0232;H01L31/12;H01L33/00;H04N5/335;H04N5/369;(IPC1-7):H01L21/00 主分类号 H01L21/00
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