发明名称 METHOD FOR MANUFACTURING REFLECTION TYPE LIGHT DIFFUSER
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflection type light diffuser which can effectively suppress the directivity and diffusivity of a reflected light beam so that they are not excessively large and reduce the cost by simplifying manufacturing processes. <P>SOLUTION: The method for manufacturing the reflection type light diffuser which includes a substrate, a resist layer, and a reflective metal layer and diffuses incident light includes the steps for: preparing a substrate which has a pixel matrix array formed on its surface, the pixel matrix array having a plurality of adjacent pixel areas each of which has two parallel opposite side edge parts; forming on the substrate (60) a resist layer where a resist pattern including a slit structure (70) positioned at the side edge of the pixel areas and a plurality of bump structures (72) positioned in the pixel areas is formed through processes of exposure using a photomask and development; and forming the reflective metal layer (74) on the resist pattern. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003255111(A) 申请公布日期 2003.09.10
申请号 JP20020353965 申请日期 2002.12.05
申请人 CHI MEI ELECTRONICS CORP 发明人 WEI CHUNG KUANG;CHU CHENG-JEN;LIN CHIA-LIANG
分类号 G02B1/10;G02B5/02;G02B5/08;G02F1/1335;G03F7/20 主分类号 G02B1/10
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