Photocurable composition, process for producing photocurable resin, and crosslinked product

摘要

A photocurable composition is provided which yields an excellent tack-free, hard cured product without any addition of photoinitiators. A photocurable composition which is excellent in storage stability is also provided. The photocurable composition contains a resin having an acryloyl group and a chemical structure element selected from the group consisting of beta -diketone groups and beta -ketoester groups, wherein the beta -diketone group or the beta -ketoester group has a tetra-substituted carbon atom between two carbonyl groups, which is capable of generating one or two free radicals under photoirradiation, and the photocurable composition does not increase more than 25% in viscosity when heated at 60 DEG C for 5 days.