发明名称 CONTACT PROBE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To reduce a capacitance provided at a contact probe and to enhance electrical characteristics in the contact probe and in a method of manufacturing the contact probe. SOLUTION: In the contact probe 10, a plurality of pattern interconnections 12 are formed on the surface of a film 11, and respective tip parts of the pattern interconnections are arranged in a tip part of the film so as to be used as contact pins 12a. The rear side of the film is provided with a metal layer 11b. The metal layer is constituted of a tip-part region 11c, extending at right angles to the plurality of pattern interconnections in the tip part of the film; a base- end-part region 11c arranged in a base end part of the film; and connection regions 11e extended in a thin belt shape up to the region 11d from the region 11c. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003248019(A) 申请公布日期 2003.09.05
申请号 JP20020048197 申请日期 2002.02.25
申请人 MITSUBISHI MATERIALS CORP 发明人 IWAMOTO TAKAFUMI;KATO NAOKI;SUGIYAMA TATSUO;ASO TAKESHI;YOSHIDA HIDEAKI;NAKAMURA TADASHI
分类号 G01R1/073;G01R31/28;H01L21/66;(IPC1-7):G01R1/073 主分类号 G01R1/073
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