CMP FORMULATIONS FOR THE USE ON NICKEL-PHOSPHORUS ALLOYS
摘要
<p>CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.</p>
申请公布号
WO03072671(A1)
申请公布日期
2003.09.04
申请号
WO2003US04935
申请日期
2003.02.18
申请人
SAINT-GOBAIN CERAMICS & PLASTICS, INC.;WARD, DOUGLAS, EDWIN;SOLOMOS, DAVID, PETER
