Integrated circuits having and adjacent p-type doped regions having shallow trench isolation structures without liner layers therein therebetween and methods of forming same

摘要

An integrated circuit substrate includes first and second adjacent p-type doped regions spaced-apart from one another. A trench in the integrated circuit substrate is between the first and second adjacent p-type doped regions. An insulator layer in the trench has a side wall, wherein the side wall is free of a layer that reduces a stress between the integrated circuit substrate and the insulator layer.