发明名称 |
System and method for using a two part cover for protecting a reticle |
摘要 |
A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer. <IMAGE>
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申请公布号 |
EP1341042(A2) |
申请公布日期 |
2003.09.03 |
申请号 |
EP20030003288 |
申请日期 |
2003.02.24 |
申请人 |
ASML HOLDING N.V. |
发明人 |
DEL PUERTO, SANTIAGO;MASSAR, ANDREW;ALIKHAN, ABDULLAH;FEROCE, JONATHAN H.;LOOPSTRA, ERIC R.;KISH, DUANE P.;OLSON, WOODROW J. |
分类号 |
B65G49/07;G03B27/42;G03B27/48;G03B27/58;G03F1/24;G03F1/62;G03F1/64;G03F1/66;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03F7/20;H01L21/00 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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