| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an insulation film of low permittivity material having a dielectric constant not higher than 2.5 using a porous material. SOLUTION: The method for producing an insulation film comprises a first heating step for generating a siloxane bond after coating a substrate with a coating liquid containing at least one kind of compound capable of generating a siloxane bond through dehydration condensation, and an organic polymer, and a second heating step for removing the organic polymer wherein a oxygen concentration is not higher than 1000 ppm when a substrate temperature is not lower than 200°C. COPYRIGHT: (C)2003,JPO
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