| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having satisfactory transparency when a source of light with 157 nm is used and excellent in sensitivity and resolution. <P>SOLUTION: The positive resist composition comprises (A) a resin containing a repeating unit having a fluorine atom in the principal chain and a group having -NH- in a side chain and having solubility in an alkali developer increased by the action of an acid and (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation. <P>COPYRIGHT: (C)2003,JPO |
