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发明名称
Etching a substrate using an inductively coupled plasma
摘要
申请公布号
GB2385709(A)
申请公布日期
2003.08.27
申请号
GB20030006752
申请日期
2001.08.23
申请人
* ROBERT BOSCH GMBH;* ROBERT BOSCH GMBH
发明人
KLAUS * BREITSCHWERDT;VOLKER * BECKER;FRANZ * LAERMER;ANDREA * SCHILP
分类号
H01J37/32;(IPC1-7):H01J37/32
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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