| 摘要 |
PROBLEM TO BE SOLVED: To obtain a method and an apparatus for examining defect capable of detecting a defect in high sensitivity even when a surface to be examined is in a non-mirror state. SOLUTION: A laser beam Lb1 is radiated from a laser beam source 5 and a laser beam La1 is radiated from a laser beam source 3. The intensity of a regular reflecting light La2 detected by a detector 4 is processed as prescribed by a signal processing part 7, and then input to a haze value calculating part 8. The haze value calculated by the calculating part 8 is input to a controller 9 and a defect detecting part 11. The controller 9 sets a sampling frequency so as to perform at least three times of samplings for each haze undulation in response to the haze value. The intensity of the scattered light Lb2 is detected by a detector 6 in the set sampling frequency, processed as prescribed by a signal processing part 10, and then input to the defect detecting part 11. COPYRIGHT: (C)2003,JPO
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