发明名称 CMOS imager and method of formation
摘要 One or more deep-array implants under the photosensitive region of a semiconductor substrate are conducted to improve optical cross-talk between pixel cells. According to an embodiment of the present invention, one or more deep-array implants of a first conductivity type are used to dope predefined regions of a well of a second conductivity type. This way, first conductivity type dopants from the one or more deep-array implants counterdope second conductivity type dopants from the predefined regions of the well. The dosage and energy of each deep-array implant may be optimized so that the collection of signal carriers by the photosensitive region and the photoresponse for different wavelengths are maximized.
申请公布号 US6608338(B2) 申请公布日期 2003.08.19
申请号 US20010941554 申请日期 2001.08.30
申请人 MICRON TECHNOLOGY, INC. 发明人 RHODES HOWARD E.
分类号 H01L27/146;(IPC1-7):H01L31/062 主分类号 H01L27/146
代理机构 代理人
主权项
地址