| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron beam exposure method and a reticule, for exposing a doughnut pattern, a leaf-pattern, etc. <P>SOLUTION: A reticule 100 comprises a first reticule 101 and a second reticule 103. A pattern (main pattern) is formed at the first reticule 101 where each end of a plurality of linear elements which are divisions of an element graphic of a pattern P is so extended as to be connected to a membrane part (skirt part) at the end of a pattern region on the reticule or to the other linear element. On the second reticule 103, a pattern in reverse to that of a linear element E (extended linear element) is formed. Using the first reticule 101 and the second reticule 103, the main pattern and the reversal pattern are stacked in the same region on a sensitized board for exposure and transfer. <P>COPYRIGHT: (C)2003,JPO</p> |
