发明名称 |
AUGER-BASED THIN FILM METROLOGY |
摘要 |
Apparatus for analysis of a thin film formed over an underlying layer on a surface of a sample, the thin film including first elements, while the underlying layer includes second elements. The apparatus includes an electron gun, which directs a beam of electrons to impinge on a point on the surface of the sample at which the thin film is formed. An electron detector receives Auger electrons emitted by the first and second elements responsive to the impinging beam of electrons, and to output a signal indicative of a distribution of energies of the emitted electrons. A controller receives the signal and analyzes the distribution of the energies so as to determine a composition of the first elements in the thin film and a thickness of the thin film. |
申请公布号 |
WO03067234(A2) |
申请公布日期 |
2003.08.14 |
申请号 |
WO2003US03552 |
申请日期 |
2003.02.04 |
申请人 |
APPLIED MATERIALS, INC.;APPLIED MATERIALS ISRAEL, LTD. |
发明人 |
KADYSHEVITCH, ALEXANDER;SIMON, AVI |
分类号 |
G01N23/203;G01N23/227;G01Q30/02 |
主分类号 |
G01N23/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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