发明名称 |
Apparatus and method to control the uniformity of plasma by reducing radial loss |
摘要 |
A capacitively coupled plasma reactor composed of: a reactor chamber enclosing a plasma region; upper and lower main plasma generating electrodes for generating a processing plasma in a central portion of the plasma region by transmitting electrical power from a power source to the central portion while a gas is present in the plasma region; and a magnetic mirror including at least one set of magnets for maintaining a boundary layer plasma in a boundary portion of the plasma region around the processing plasma. A capacitively coupled plasma reactor composed of: a reactor chamber enclosing a plasma region; upper and lower plasma generating electrodes for generating a processing plasma in the plasma region by transmitting electrical power from a power source to the plasma region while a gas is present in the plasma region; and power supplies for applying a VHF drive voltage to the upper plasma generating electrode and RF bias voltages at a lower frequency than the VHF drive voltage to the upper and lower plasma generating electrodes.
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申请公布号 |
US2003150562(A1) |
申请公布日期 |
2003.08.14 |
申请号 |
US20030378691 |
申请日期 |
2003.03.05 |
申请人 |
QUON BILL H. |
发明人 |
QUON BILL H. |
分类号 |
C03C15/00;C23C16/00;C23F1/00;H01J37/32;H01L21/461;(IPC1-7):C23F1/00 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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