发明名称 COMPOSITION FOR FORMING PHOTOSENSITIVE DIELECTRIC MATERIAL, AND TRANSFER FILM, DIELECTRIC MATERIAL AND ELECTRONIC PARTS USING THE SAME
摘要 A composition for forming a photosensitive dielectric material containing inorganic particles, a resin capable of being developed with an alkaline reagent and an additive, wherein the additive comprises (C1) a compound having a quinonediazide group, (C2) a compound having at least two amino groups modified so as to have an alkyl ether moiety and (C3) a thermosensitive acid-generating agent, or wherein the composition comprises (A-I) an ultra-fine inorganic powder having an average particle diameter of less than 0.05 mum and (A-II) a fine inorganic powder having an average particle diameter of 0.05 mum or more; and a dielectric material and electronic parts formed from the composition. The above composition allows the formation of a dielectric material layer which is reduced in heat loss, is capable of being fired at a reduced temperature and has a high dielectric constant, with good dimensional accuracy.
申请公布号 WO03065384(A1) 申请公布日期 2003.08.07
申请号 WO2002JP13662 申请日期 2002.12.26
申请人 JSR CORPORATION;ITO, NOBUYUKI;MASUKO, HIDEAKI;HASEGAWA, SATOMI;ITO, ATSUSHI;INOMATA, KATSUMI 发明人 ITO, NOBUYUKI;MASUKO, HIDEAKI;HASEGAWA, SATOMI;ITO, ATSUSHI;INOMATA, KATSUMI
分类号 G03F7/004;G03F7/022;G03F7/027;G03F7/033;(IPC1-7):H01B3/00 主分类号 G03F7/004
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