发明名称 Object separating method, and method of manufacturing semiconductor substrate
摘要 <p>An apparatus for separating a substrate having a porous layer at the porous layer is provided. A bonded substrate stack (101) having a porous layer (101b) is supported by substrate holding portions (108, 109) while being rotated. High-speed, high-pressure water (jet) is ejected from a nozzle (112) and injected against the bonded substrate stack (101), thereby physically separating the bonded substrate stack (101) into two substrates. The jet pressure is appropriately changed in accordance with progress of separation processing. &lt;IMAGE&gt; &lt;IMAGE&gt;</p>
申请公布号 EP0925887(B1) 申请公布日期 2003.08.06
申请号 EP19980310411 申请日期 1998.12.18
申请人 CANON KABUSHIKI KAISHA 发明人 OMI, KAZUAKI;YONEHARA, TAKAO;SAKAGUCHI, KIYOFUMI;YANAGITA, KAZUTAKA
分类号 H01L21/306;B26F3/00;H01L21/00;H01L21/02;H01L21/68;H01L27/12;(IPC1-7):B26F3/00 主分类号 H01L21/306
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