发明名称 |
Object separating method, and method of manufacturing semiconductor substrate |
摘要 |
<p>An apparatus for separating a substrate having a porous layer at the porous layer is provided. A bonded substrate stack (101) having a porous layer (101b) is supported by substrate holding portions (108, 109) while being rotated. High-speed, high-pressure water (jet) is ejected from a nozzle (112) and injected against the bonded substrate stack (101), thereby physically separating the bonded substrate stack (101) into two substrates. The jet pressure is appropriately changed in accordance with progress of separation processing. <IMAGE> <IMAGE></p> |
申请公布号 |
EP0925887(B1) |
申请公布日期 |
2003.08.06 |
申请号 |
EP19980310411 |
申请日期 |
1998.12.18 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
OMI, KAZUAKI;YONEHARA, TAKAO;SAKAGUCHI, KIYOFUMI;YANAGITA, KAZUTAKA |
分类号 |
H01L21/306;B26F3/00;H01L21/00;H01L21/02;H01L21/68;H01L27/12;(IPC1-7):B26F3/00 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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