发明名称 ELECTRON BEAM IRRADIATION DEVICE AND SCANNING ELECTRON MICROSCOPE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation device allowing simplification, miniaturization and cost reduction of the device, or reduction of conductance of evacuation. SOLUTION: This electron beam irradiation device is at least provided with: an electron beam source; an acceleration electrode for accelerating electrons emitted from the electron beam source; and an electron lens for converging the accelerated electron beam; and a means for sweeping the irradiation position of the electron beam onto a sample. An evacuation system of the electron beam irradiation device is stopped when reaching a set value of a first degree of vacuum. The evacuation system of the electron beam irradiation device is operated when reaching a set value of a second degree of vacuum lower than that of the first degree of vacuum. The electron beam irradiation is executed when the degree of vacuum is between the set value of the first degree of vacuum and the set value of the second degree of vacuum and when the evacuation system is stopped. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003217493(A) 申请公布日期 2003.07.31
申请号 JP20020018725 申请日期 2002.01.28
申请人 CANON INC 发明人 AEBA TOSHIAKI;OTSUKA MITSURU
分类号 H01J37/18;H01J37/28;(IPC1-7):H01J37/18 主分类号 H01J37/18
代理机构 代理人
主权项
地址