发明名称 Gas distribution showerhead
摘要 A gas distribution showerhead for use in a semiconductor fabrication process features a face plate having gas outlet ports in the form of elongated slots or channels. The use of elongated gas outlet ports in accordance with embodiments of the present invention substantially reduces the incidence of undesirable spotting and streaking of deposited material where the showerhead is closely spaced from the wafer. A showerhead featuring a face plate having a tapered profile to reduce edge thickness of deposited material at close face plate-to-wafer spacings is also disclosed.
申请公布号 US2003140851(A1) 申请公布日期 2003.07.31
申请号 US20020057280 申请日期 2002.01.25
申请人 APPLIED MATERIALS, INC. 发明人 JANAKIRAMAN KARTHIK;INGLE NITIN;YUAN ZHENG;GIANOULAKIS STEVEN
分类号 C23C16/44;C23C16/455;H01L21/31;(IPC1-7):C23C16/00 主分类号 C23C16/44
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