发明名称 Method and structure to segment RF coupling to silicon electrode
摘要 An electrode assembly for use in a plasma processing system including a base electrode adapted to be coupled to a source of RF energy, a removable electrode removably coupled to the base electrode, and a material interposed between a surface of the base electrode and a surface of the removable electrode.
申请公布号 US2003141795(A1) 申请公布日期 2003.07.31
申请号 US20030355203 申请日期 2003.01.31
申请人 STRANG ERIC J.;MITROVIC ANDREJ S. 发明人 STRANG ERIC J.;MITROVIC ANDREJ S.
分类号 H01J37/32;(IPC1-7):H01J1/02 主分类号 H01J37/32
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