| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a new refractive index control type laser lithography waveguide with which an optical waveguide having a very small light scattering loss and a high quality can be easily obtained. SOLUTION: An aperture 3 is inserted to reduce the diameter of parallel beams B1 of ultrashort pulses to a desired diameter just before the parallel laser beam B1 are converged by a lens and the surface or the inside of a transparent material 2 having a low refractive index is irradiated with the beams B1 while moving the material 2 at desired speed, and then the parallel beams B1 are converged by a lens L and the material 2 is irradiated with the beams B1 to form a light propagation layer 4 having an approximately stepwise refractive index distribution on the material 2. Since the peripheral part of the light propagation layer 4 obtained in this manner has a sharp refractive index, the light loss caused by structure nonuniformity of the peripheral part is considerably reduced. COPYRIGHT: (C)2003,JPO |
