| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method having a resonant frequency within the allowable margin of the error of a target resonant frequency and a thin film bulk acoustic resonator (FBAR) to be reproduced as a result, and further to provide a production method for stabilizing the resonant frequency of the FBAR for avoiding an undesired frequency shift. SOLUTION: The method for adjusting the resonant frequency of an acoustic resonator is provided with a step for identifying electrode-piezoelectric stacks (72 and 86) equipped with conductive electrode layers (74 and 78) on both sides respectively while having resonant frequencies out of a target, and a step for oxidizing at least one of the conductive electrode layers (74 and 78) to achieve and target resonant frequency different from the resonant frequencies out of the target while including the intentional induction of oxidization by exposing at least one of the conductive electrode layers (74 and 78) of the electrode- piezoelectric stacks (72 and 86) under an oxide environment. COPYRIGHT: (C)2003,JPO
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