发明名称 NON-VOLATILE TWO-TRANSISTOR SEMICONDUCTOR MEMORY CELL AND METHOD FOR PRODUCING THE SAME
摘要 The invention relates to a non-volatile two-transistor semiconductor memory cell and to a method for producing the same. In a substrate (1), source and drain regions (2) for a selection transistor (AT) and a memory transistor (ST) are configured. Said memory transistor (ST) has a first insulating layer (3), a charge storage layer (4), a second insulating layer (5) and a memory transistor control layer (6). The selection transistor (AT) comprises a first insulating layer (3') and a selection transistor control layer (4*). The use of different materials for the charge storage layer (4) and the selection transistor control layer (4*) allows to substantially improve the charge maintaining properties of the memory cell while maintaining constant electrical properties by adapting the substrate doping.
申请公布号 WO03061011(A2) 申请公布日期 2003.07.24
申请号 WO2002DE04521 申请日期 2002.12.10
申请人 INFINEON TECHNOLOGIES AG;SCHULER, FRANZ;TEMPEL, GEORG 发明人 SCHULER, FRANZ;TEMPEL, GEORG
分类号 H01L21/8247;G11C16/04;H01L21/8246;H01L27/105;H01L27/115;H01L29/788;H01L29/792;H01L31/113 主分类号 H01L21/8247
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