发明名称 |
NON-VOLATILE TWO-TRANSISTOR SEMICONDUCTOR MEMORY CELL AND METHOD FOR PRODUCING THE SAME |
摘要 |
The invention relates to a non-volatile two-transistor semiconductor memory cell and to a method for producing the same. In a substrate (1), source and drain regions (2) for a selection transistor (AT) and a memory transistor (ST) are configured. Said memory transistor (ST) has a first insulating layer (3), a charge storage layer (4), a second insulating layer (5) and a memory transistor control layer (6). The selection transistor (AT) comprises a first insulating layer (3') and a selection transistor control layer (4*). The use of different materials for the charge storage layer (4) and the selection transistor control layer (4*) allows to substantially improve the charge maintaining properties of the memory cell while maintaining constant electrical properties by adapting the substrate doping. |
申请公布号 |
WO03061011(A2) |
申请公布日期 |
2003.07.24 |
申请号 |
WO2002DE04521 |
申请日期 |
2002.12.10 |
申请人 |
INFINEON TECHNOLOGIES AG;SCHULER, FRANZ;TEMPEL, GEORG |
发明人 |
SCHULER, FRANZ;TEMPEL, GEORG |
分类号 |
H01L21/8247;G11C16/04;H01L21/8246;H01L27/105;H01L27/115;H01L29/788;H01L29/792;H01L31/113 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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