发明名称 Methods for forming features in polymer layers
摘要 <p>Methods of forming features in polymeric materials by laser ablation techniques alone, or by the combined use of laser ablation techniques and photolithography, are disclosed. The methods can be used to pattern non-photosensitized materials, as well as photosensitized materials. The patterned features can have different shapes, dimensions and aspect ratios in the same polymer layer. Structures including the patterned features can include multiple layers formed of photosensitized and/or non-photosensitized polymer materials. <IMAGE></p>
申请公布号 EP1329320(A1) 申请公布日期 2003.07.23
申请号 EP20030250018 申请日期 2003.01.06
申请人 XEROX CORPORATION 发明人 ANDREWS, JOHN R.;MARKHAM, ROGER G.;BURKE, CATHIE J.
分类号 B41J2/05;B23K26/06;B23K26/38;B23K26/40;B29C59/16;B41J2/16;(IPC1-7):B41J2/16;B23K26/00 主分类号 B41J2/05
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