| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processor which can suppress an in-film defects, peeling of a film and in-film particles, and can easily manufacture a product of large area. SOLUTION: The plasma processor is provided with a vacuum chamber 1 and a shower head 2 arranged in the vacuum chamber 1. The shower head 2 has an inner space 3 and multiple pores 6, passing through a surface facing a substrate 12 from the base of the inner space 3 for making a gas diffuse introducing it into the vacuum chamber 1. The height of the inner space 3 is large at the center part and low at the peripheral part. COPYRIGHT: (C)2003,JPO
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